- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 9/00 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patent holdings for IPC class G03F 9/00
Total number of patents in this class: 2489
10-year publication summary
|
150
|
149
|
188
|
227
|
274
|
211
|
187
|
181
|
166
|
58
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 6816 |
701 |
| Canon Inc. | 36841 |
221 |
| Nikon Corporation | 7162 |
183 |
| ASML Holding N.V. | 542 |
127 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
98 |
| Kioxia Corporation | 9847 |
45 |
| Applied Materials, Inc. | 16587 |
44 |
| Shanghai Micro Electronics Equipment (Group) Co., Ltd. | 243 |
43 |
| KLA-Tencor Corporation | 2574 |
33 |
| Carl Zeiss SMT GmbH | 2646 |
29 |
| V Technology Co., Ltd. | 394 |
29 |
| Changxin Memory Technologies, Inc. | 4732 |
28 |
| Boe Technology Group Co., Ltd. | 35384 |
26 |
| Samsung Electronics Co., Ltd. | 131630 |
22 |
| FUJIFILM Corporation | 27102 |
19 |
| KLA Corporation | 1223 |
18 |
| Micronic Mydata AB | 73 |
16 |
| Molecular Imprints, Inc. | 324 |
15 |
| Micron Technology, Inc. | 24960 |
13 |
| D2s, Inc. | 150 |
13 |
| Other owners | 766 |